Volume 12, Issue 1, November 2014, Pages 148–156
Sadhan Chandra Das1, Abhijit Majumdar2, and Rainer Hippler3
1 UGC DAE CSR, Indore 452017, Khandwa road, MP, India
2 Institute of Physics, University of Greifswald, Felix Hausdorff str 6, 17489 Greifswald, Germany
3 Institute of Physics, University of Greifswald, Felix Hausdorff str 6, 17489 Greifswald, Germany
Original language: English
Copyright © 2014 ISSR Journals. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
The comparative study of chemical properties and electronic bond structure of amorphous carbon (a-C), hydrocarbon (a-HC), carbon nitride (a-CNx) and hydrogenated carbon nitride (a-HCNy) is reported here. The spectroscopic analyses suggest that the presence of oxide layer is not only the prime cause but the presence of nitrogen is partially responsible for the chemical shift towards higher binding energy. In x-ray photoelectron spectroscopy (XPS), C 1s spectra of a-HCNy film shows higher chemical shifts compare to a-C, a-HC and a-CNx. Raman spectra display a strong fluorescence effect of a-HC and a-HCNy where as a-C and a-CNx exhibits a promising G and D band at room temperature. Fourier transform infrared spectroscopy (FTIR) spectra show a large NH-OH over lapping region in a-HCNy compare to a-HC and a-CNx film whereas it is negligible in a-C. FTIR spectra show that the a-C, a-HC and a-CNx films are dominated by sp2 bonded region while a-HCNy is the mixture of sp2, sp3 and hydrogen bridging bond.
Author Keywords: Carbon nitride, Hydrogenated carbon nitride, Amorphous carbon, Hydrocarbon, Chemical shift, XPS, FTIR.
Sadhan Chandra Das1, Abhijit Majumdar2, and Rainer Hippler3
1 UGC DAE CSR, Indore 452017, Khandwa road, MP, India
2 Institute of Physics, University of Greifswald, Felix Hausdorff str 6, 17489 Greifswald, Germany
3 Institute of Physics, University of Greifswald, Felix Hausdorff str 6, 17489 Greifswald, Germany
Original language: English
Copyright © 2014 ISSR Journals. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
The comparative study of chemical properties and electronic bond structure of amorphous carbon (a-C), hydrocarbon (a-HC), carbon nitride (a-CNx) and hydrogenated carbon nitride (a-HCNy) is reported here. The spectroscopic analyses suggest that the presence of oxide layer is not only the prime cause but the presence of nitrogen is partially responsible for the chemical shift towards higher binding energy. In x-ray photoelectron spectroscopy (XPS), C 1s spectra of a-HCNy film shows higher chemical shifts compare to a-C, a-HC and a-CNx. Raman spectra display a strong fluorescence effect of a-HC and a-HCNy where as a-C and a-CNx exhibits a promising G and D band at room temperature. Fourier transform infrared spectroscopy (FTIR) spectra show a large NH-OH over lapping region in a-HCNy compare to a-HC and a-CNx film whereas it is negligible in a-C. FTIR spectra show that the a-C, a-HC and a-CNx films are dominated by sp2 bonded region while a-HCNy is the mixture of sp2, sp3 and hydrogen bridging bond.
Author Keywords: Carbon nitride, Hydrogenated carbon nitride, Amorphous carbon, Hydrocarbon, Chemical shift, XPS, FTIR.
How to Cite this Article
Sadhan Chandra Das, Abhijit Majumdar, and Rainer Hippler, “Electronic and chemical property of amorphous carbon, hydrocarbon, hydrogenated / hydrogen free carbon nitride: spectroscopic study,” International Journal of Innovation and Scientific Research, vol. 12, no. 1, pp. 148–156, November 2014.
